The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2005
Filed:
Apr. 30, 2004
Nicholas F. Borrelli, Elmira, NY (US);
Paul S. Danielson, Corning, NY (US);
Michael R. Heslin, Elmira, NY (US);
Stephan L. Logunov, Corning, NY (US);
Johannes Moll, Painted Post, NY (US);
Paul M. Schermerhorn, Painted Post, NY (US);
Charlene M. Smith, Corning, NY (US);
Nicholas F. Borrelli, Elmira, NY (US);
Paul S. Danielson, Corning, NY (US);
Michael R. Heslin, Elmira, NY (US);
Stephan L. Logunov, Corning, NY (US);
Johannes Moll, Painted Post, NY (US);
Paul M. Schermerhorn, Painted Post, NY (US);
Charlene M. Smith, Corning, NY (US);
Corning Incorporated, Corning, NY (US);
Abstract
The invention provides an ultraviolet lithography method/system. The lithography method and system include providing a below 200 nm radiation source, providing a photolytically improved transmitting fused silica glass lithography optical element, transmitting below 200 nm photons through said photolytically improved transmitting fused silica glass lithography optical element to form a lithography pattern which is reduced and projected onto a radiation sensitive lithography printing medium to form a printed lithography pattern. Providing the photolytically improved transmitting fused silica glass lithography optical element includes providing a photolytically improved transmitting fused silica glass lithography optical element preform body and forming the photolytically improved transmitting fused silica glass lithography optical element preform into said lithography optical element.