The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2005
Filed:
Oct. 17, 2002
Hidehiko Nakata, Kawasaki, JP;
Hidehiko Nakata, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A manufacturing method for an optical integrated circuit including a spatial reflection type structure having a perpendicular end surface and an inclined surface formed in an optical waveguide layer. The manufacturing method includes the steps of applying a first photoresist to the upper surface of the optical waveguide layer, removing the first photoresist except a portion corresponding to the inclined surface, and heating the first preferred embodiment to a given temperature to melt the first photoresist at least partially and deform the first photoresist by surface tension, thereby forming a first mask having an inclined shape. The manufacturing method further includes the steps of applying a second photoresist to the upper surfaces of the optical waveguide layer and the first mask, removing the second photoresist at a portion ranging from a position corresponding to the perpendicular end surface to a position corresponding to the upper end of the inclined surface to form a second mask, and etching the first mask, the second mask, and the optical waveguide layer by RIE to thereby simultaneously form the perpendicular end surface and the inclined surface.