The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2005
Filed:
Sep. 10, 2001
Junji Kurachi, Takarazuka, JP;
Kazuishi Mitani, Takarazuka, JP;
Yasuhiro Saito, Takatuki, JP;
Hiroyuki Inomata, Takarazuka, JP;
Junji Kurachi, Takarazuka, JP;
Kazuishi Mitani, Takarazuka, JP;
Yasuhiro Saito, Takatuki, JP;
Hiroyuki Inomata, Takarazuka, JP;
Nippon Sheet Glass Co., Ltd., Osaka, JP;
Abstract
There are provided a method of processing an amorphous material which is capable of forming surface projections of uniform height in desired positions on the amorphous material, and a magnetic disk substrate using the amorphous material. A predetermined pressure is applied to parts of a surface of an amorphous material to form high-density compressed layers, and a surface layer of the amorphous material is removed using a treatment agent that has a different removal capacity in the compressed layers and a remaining uncompressed layer, thus making the compressed layers project out. For example, the treatment agent may be an etching solution having a different etching rate in the compressed layers and the uncompressed layer.