The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2005
Filed:
Jun. 17, 2002
Hongqing Shan, Cupertino, CA (US);
Hongqing Shan, Cupertino, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A system for processing substrates includes a first process chamber configured to perform a given process on a first substrate. A second process chamber is configured to perform the same process as the first chamber on a second substrate. A gas source system is configured to output a process gas. A gas flow system includes a flow channel coupled to the gas source system and the first and second process chambers to provide the process gas into the first and second process chambers. The gas source system further includes a gas flow controller to regulate flow rates of the process gas provided into the first and second chambers in order to provide the first and second substrates with substantially uniform process results.