The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2005
Filed:
Sep. 07, 2001
Ashok Lahiri, Mainz, DE;
Edward Hin Pong Lee, San Jose, CA (US);
Eric James Lee, San Jose, CA (US);
Hong Xu, San Jose, CA (US);
Ashok Lahiri, Mainz, DE;
Edward Hin Pong Lee, San Jose, CA (US);
Eric James Lee, San Jose, CA (US);
Hong Xu, San Jose, CA (US);
Hitachi Global Storage Technologies Netherlands, B.V., Amsterdam, NL;
Abstract
A process for forming the Ppole tip/yoke interface of a magnetic head that includes a second CMP polishing step that is performed on the surface of the write head wafer subsequent to the plating of the Ppole tip thereon, and subsequent to a first CMP step. This second CMP step utilizes a relatively soft polishing pad and an acidic polishing slurry which preferentially attacks the Ppole tip material. This results in the recession of the upper surface of the Ppole tip relative to the dielectric layer surrounding it, and significant rounding of the upper edges of the dielectric trench in which the Ppole tip is formed. Thereafter, when the yoke is plated onto the Ppole tip the rounded upper edges of the dielectric trench result in a concave curved interface between the yoke and the Ppole tip.