The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2005

Filed:

Sep. 05, 2003
Applicants:

Chan-ho Park, Bucheon, KR;

Jin-myung Kim, Incheon Metropolitan, KR;

Kyeong-seok Park, Bucheon, KR;

Dong-ho Hyun, Bucheon, KR;

Inventors:

Chan-ho Park, Bucheon, KR;

Jin-myung Kim, Incheon Metropolitan, KR;

Kyeong-seok Park, Bucheon, KR;

Dong-ho Hyun, Bucheon, KR;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L027/082 ;
U.S. Cl.
CPC ...
Abstract

A bipolar transistor in which the occurrence of Kirk effect is suppressed when a high current is injected into the bipolar transistor and a method of fabricating the bipolar transistor are described. The bipolar transistor includes a first collector region of a first conductive type having high impurity concentration, a second collector region of a first conductive type which has high impurity concentration and is formed on the first collector region, a base region of a second conductive type being formed a predetermined portion of the second collector region, and an emitter region of a first conductive type being formed in the base region. The bipolar transistor further includes the third collector region, which has higher impurity concentration than the second collector region, at the bottom of the base region. Therefore, it is possible to prevent the base region from extending toward the second collector region due to the third collector region when a high current is injected into the bipolar transistor, thereby improving the capability of driving a current of the bipolar transistor and preventing the occurrence of Kirk effect even during the injection of a high current.


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