The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2005
Filed:
Nov. 19, 2002
Peter S. Pappas, Juno Beach, FL (US);
Alan Monk, Warrington, GB;
Shashikant Saraiya, Parlin, NJ (US);
Jianbing Huang, Trumbull, CT (US);
Peter S. Pappas, Juno Beach, FL (US);
Alan Monk, Warrington, GB;
Shashikant Saraiya, Parlin, NJ (US);
Jianbing Huang, Trumbull, CT (US);
Kodak Polychrome Graphics LLC, Norwalk, CT (US);
Abstract
The present invention also includes an imageable element, comprising a substrate and a thermally imageable composition comprising a thermally sensitive polymer which exhibits an increased solubility in an aqueous developer solution upon heating. The thermally sensitive polymer includes at least one covalently bonded unit and at least one thermally reversible non-covalently bonded unit, which includes a two or more centered H-bond within each of the non-covalently bonded unit. The present invention also includes a method of producing the imaged element. The present invention still further includes a thermally imageable composition comprising comprising a thermally sensitive polymer according to the present invention and a process for preparing the thermally sensitive polymer, which is a supramolecular polymer. The process includes contacting a hydrocarbyl-substituted isocytosine and a diisocyanate to produce a mono-adduct and contacting the mono-adduct and a polyfunctional material to produce the supramolecular polymer.