The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2005

Filed:

Jun. 13, 2002
Applicants:

Terry Lee Jensen, Rochester, MN (US);

John William Marier, Byron, MN (US);

Douglas Howard Piltingsrud, Eyota, MN (US);

Rick Allan Sprague, San Jose, CA (US);

Inventors:

Terry Lee Jensen, Rochester, MN (US);

John William Marier, Byron, MN (US);

Douglas Howard Piltingsrud, Eyota, MN (US);

Rick Allan Sprague, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D001/18 ; C23F001/00 ;
U.S. Cl.
CPC ...
Abstract

A method of adjusting the pH of a strengthening melt to provide an adjusted melt for use in microetching glass substrates, such as glass disk substrates for use in data storage devices. A base is added to the strengthening melt to raise its pH. A desired degree of microetch is provided on an aluminosilicate glass disk substrate, for example, by immersion for 2-4 hours at 360° C. in a melt adjusted to have a pH of 10. This single operation both strengthens and microetches the glass substrate. A slight etching of the surface of a glass substrate, i.e., microetching, improves the performance and durability of a data storage disk made from the substrate. To avoid an overly aggressive etch that can create undesirable damage to the substrate surface, an acid may be added to the melt if the pH is subsequently determined to have shifted to above an upper limit.


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