The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2005
Filed:
Sep. 04, 2001
Naotaka Hashimoto, Takatsuki, JP;
Yuuji Omata, Toyonaka, JP;
Naotaka Hashimoto, Takatsuki, JP;
Yuuji Omata, Toyonaka, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
When forming an optical thin film on a surface of a bulb of a light source such as an electric lamp or a discharge lamp, a thin film whose interface/surface is less rough is formed on a base having a spheroid shape. When forming a thin film on a basewith a spheroid shape, which is disposed in a vacuum chamberof a film-forming device and spun on its rotation axis, an interface or a surface of the thin film is made less rough and the thickness distribution of the thin film is made smaller by setting a sputtering gas pressure to be in a range from 0.04 Pa to 5.0 Pa; by using, as a sputtering gas, a mixed gas of Ar gas and Ngas in which the Ngas is present at a partial pressure ratio of 1 to 6 assuming a partial pressure of the Ar gas is 100, or a mixed gas of Ar gas, Ngas, and Ogas in which the Ngas is present at a partial pressure ratio of 1 to 6 and Ogas is present at a partial pressure ratio of 6 or less assuming a partial pressure of the Ar gas is 100; by setting an input power applied at the start of thin film formation to be the greatest throughout a sputtering process; or by applying a negative bias to the base.