The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6911088 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 28, 2005

Filed:

Mar. 18, 2003
Applicants:

Hiroyuki Kitazawa, Kyoto, JP;

Tsutomu Ueyama, Kyoto, JP;

Inventors:

Hiroyuki Kitazawa, Kyoto, JP;

Tsutomu Ueyama, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C005/00 ;
U.S. Cl.
CPC ...
Abstract

A slit nozzle includes a solution feeding mechanism having an elastic element and a plurality of piezoelectric devices and embedded in a side surface of a flow passage near a slit in the slit nozzle. Control is effected so that the piezoelectric devices are vibrated to cause the elastic element to produce traveling waves toward the slit. A resist solution serving as a processing solution is pumped by the traveling waves, thereby to be discharged through the slit toward a substrate. This provides a substrate processing apparatus capable of smoothly discharging the processing solution to accomplish high discharge accuracy.


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Kitazawa, Hiroyuki. (2005). Substrate processing apparatus and slit nozzle (U.S. Patent No. 6911088). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6911088

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