The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2005
Filed:
Jan. 22, 2003
Keiichi Sato, Tokyo, JP;
Susumu Kuwabata, Osaka, JP;
Keiichi Sato, Tokyo, JP;
Susumu Kuwabata, Osaka, JP;
Hitachi Software Engineering Co., LTD, Kanagawa, JP;
Abstract
Multi-layered semiconductor nanoparticles having a very narrow grain-size distribution and exhibiting a spectrum having a narrow wavelength-width peak are prepared by a manufacturing method combining a monodisperse semiconductor nanoparticle manufacturing method and a multi-layer semiconductor nanoparticle preparation method. The nature of a solution of monodisperse semiconductor nanoparticles that is stabilized by a surface stabilizer is transformed between hydrophilic and lipophilic by substituting the surface stabilizer. The stabilized semiconductor nanoparticles are then shifted between an aqueous layer and an organic layer. The semiconductor nanoparticles are coated with multiple layers in the organic layer, and the organic layer is drawn off to recover the semiconductor nanoparticles therefrom.