The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2005
Filed:
May. 21, 2004
Shuhei Yada, Mie, JP;
Masayasu Goriki, Mie, JP;
Shuhei Yada, Mie, JP;
Masayasu Goriki, Mie, JP;
Mitsubishi Chemical Corporation, Tokyo, JP;
Abstract
A subject for the invention is to stably supply an ambient gas having a given composition to a production apparatus or storage apparatus for a compound necessitating strict ambient gas regulation during the production, storage, or handling thereof, such as (meth)acrylic acid or an ester thereof which are easily polymerizable and form an explosive composition at ordinary temperature, in a manner not influenced by fluctuations in the amount of the gas used. In the invention, the pressure of the gas-phase part in a tank () or mixing vessel () is detected with a manometer (P-) or (P-), and a dry air/nitrogen mixed gas is supplied to the tank () or mixing vessel () in an amount compensating for the gas consumption. The pressure in a mixed-gas supply piping () is detected with a manometer (P-), and a dry air/nitrogen mixed gas is supplied to the piping () in an amount compensating for the gas consumption. The degree of opening of a flow control valve (V-) for nitrogen is regulated so as to be in proportion to the degree of opening of a flow control valve (V-) for dry air. Thus, a mixed gas having a given oxygen concentration is supplied.