The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6910497 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 28, 2005

Filed:

May. 01, 2003
Applicant:

Roland Bernard, Viuz-la-Chiesaz, FR;

Inventor:

Roland Bernard, Viuz-la-Chiesaz, FR;

Assignee:

Alcatel, Paris, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C005/00 ;
U.S. Cl.
CPC ...
Abstract

According to the invention, a semiconductor component manufacturing plant is constructed in a building having an upper storey and a lower storey separated from one another by a support slab and a false floor. The support slab has passageway openings, whilst the false floor consists of plates themselves having through passages. Vacuum generation means are disposed in an intermediate space situated between the support slab and the false floor which itself carries a process chamber situated in the upper space constituting a clean room. Suction means situated in the lower storey create a gaseous flow directed downwards from the clean room through the intermediate space to the lower storey. In this way, the false floor acts as a non-return mechanism for noise, thermal or chemical pollution coming from the vacuum generation means.


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