The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2005
Filed:
Oct. 29, 2003
Mark H. Eskridge, Renton, WA (US);
Gary J. Ballas, Kirkland, WA (US);
Mark H. Eskridge, Renton, WA (US);
Gary J. Ballas, Kirkland, WA (US);
Honeywell International, Inc., Morristown, NJ (US);
Abstract
A high aspect ratio microelectromechanical system device for measuring an applied force and having a suspension structure for compensating out-of-plane displacements of the device proof mass, wherein the device includes a frame; a proof mass coupled to the frame for in-plane motion along an axis of symmetry, the proof mass having first and second sets of spaced apart capacitor plates projected therefrom on each side of the axis of symmetry and oriented substantially crosswise to the axis of symmetry; and third and fourth sets of spaced apart capacitor plates oriented substantially crosswise to the axis of symmetry of the proof mass and intermeshed respectively with the first and second sets of capacitor plates, the third and fourth sets of capacitor plates being suspended for motion relative to the frame about respective first and second axes of motion oriented substantially parallel with the axis of symmetry of the proof mass.