The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 21, 2005

Filed:

Oct. 17, 2003
Applicants:

Tom Bostoen, Brugge St Andries, BE;

Thierry Pollet, Mechelen, BE;

Patrick Jan Maria Boets, Heffen, BE;

Leonard Pierre Van Biesen, Aalst, BE;

Inventors:

Tom Bostoen, Brugge St Andries, BE;

Thierry Pollet, Mechelen, BE;

Patrick Jan Maria Boets, Heffen, BE;

Leonard Pierre Van Biesen, Aalst, BE;

Assignee:

Alcatel, Paris, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04B017/00 ;
U.S. Cl.
CPC ...
Abstract

In the process of estimating attributes of a transmission line from reflectometry measurements, small yet important reflections may be drowned in the immediate reflected signal owing to the mismatch between the reference impedance with respect to which the 1-port scattering parameter of the line has been determined and the characteristic impedance of the line. The major part of the near-end reflections are eliminated by estimating the characteristic impedance of the line, and by converting the 1-port scattering parameter of the line from the reference impedance base to the estimated characteristic impedance base. However, there is still a residual influence of the near-end reflections. It is then highly necessary to determine a time zone wherein the residual near-end reflections are enclosed so as their contribution is further neutralized in the process of estimating attributes of the transmission line.


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