The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2005
Filed:
Aug. 05, 2002
Applicant:
Daniel Brown, Madison, AL (US);
Inventor:
Daniel Brown, Madison, AL (US);
Assignee:
Mems Optical, Inc., Huntsville, AL (US);
Primary Examiner:
Int. Cl.
CPC ...
G02B027/10 ;
U.S. Cl.
CPC ...
Abstract
A multi-aperture beam integrator system/method for producing an polygon or other complex optical pattern on an image plane, which can be continuously varied in size, aspect ratio, or shape, is described. The integrator/method uses optical array elements having various phase functions, which can be combined to create optical patterns. Varying the location of the optical array elements with respect to each other and/or moving individual unit cells contained within the optical array elements can create continuously varying optical patterns at a desired location.