The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2005
Filed:
Dec. 12, 2003
Applicant:
Takayuki Hirai, Osaka, JP;
Inventor:
Takayuki Hirai, Osaka, JP;
Assignee:
Sumitomo Electric Industries, Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B027/44 ; G02B005/18 ;
U.S. Cl.
CPC ...
Abstract
When a Gaussian power distribution laser beam is converted into a uniform power density beam by a converging homogenizing DOE and is divided into a plurality of homogenized beams by a diverging DOE, the power of the separated beam spatially fluctuates. For alleviating the power fluctuation of the beams, an aperture mask having a window wider than a section of the homogenized beam but narrower than a noise region at a focus of the converging homogenizer DOE. Since a homogenized beam can pass the aperture mask as a whole, the power fluctuation, in particular, near edges is reduced.