The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2005
Filed:
Apr. 04, 2003
Applicant:
Takao Nishikawa, Suwa, JP;
Inventor:
Takao Nishikawa, Suwa, JP;
Assignee:
Seiko Epson Corporation, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L029/18 ; H01L033/00 ;
U.S. Cl.
CPC ...
Abstract
A method of manufacturing a microlens array substrate is provided comprising the steps of: closely providing a substrate precursor () between a first master mold () having a plurality of curved surfaces () and a second master mold () having a plurality of projections () to form a substrate () having a plurality of lenses () formed by the curved surfaces () and recesses () formed by the projections (); removing the first and second master molds () from the substrate (); and filling the recesses () with a shading material () after the second master mold () is removed.