The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2005
Filed:
Jun. 12, 2002
Applicants:
Peter Wilhartitz, Reutte, AT;
Stefan Schönauer, Pflach, AT;
Peter Polcik, Reutte, AT;
Inventors:
Assignee:
Plansee Aktiengesellschaft, Reutte, AT;
Primary Examiner:
Int. Cl.
CPC ...
B22F007/02 ;
U.S. Cl.
CPC ...
Abstract
The invention relates to a process for manufacturing an evaporation source for physical vapor deposition. The evaporation source is formed of the actual sputtering target with an aluminum component and one or more further components as well as of a backing plate made from a material having better thermal conductivity than the target. The backing plate made of a powdery starting material is pressed, together with the powdery components of the sputtering target, into sandwiched powder fractions and then formed.