The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2005
Filed:
Feb. 26, 2002
Zuzanna Siwy, Darmstadt, DE;
Dobri D. Dobrev, Darmstadt, DE;
Reinhard Neumann, Darmstadt, DE;
Christina Trautmann, Darmstadt, DE;
Kai Voss, Darmstadt, DE;
Zuzanna Siwy, Darmstadt, DE;
Dobri D. Dobrev, Darmstadt, DE;
Reinhard Neumann, Darmstadt, DE;
Christina Trautmann, Darmstadt, DE;
Kai Voss, Darmstadt, DE;
Gesellschaft fuer Schwerionenforschung mbH, Darmstadt, DE;
Abstract
The invention relates to a method of producing nanostructures in membranes, in which method a membrane consisting of a polymer material is irradiated with charged particles, especially ions, to produce particle tracks. The particle tracks in the membrane are etched using an etching liquid and the etching operation is stopped using a stop liquid, in such a manner that asymmetrical structures are formed. Polyimide is used as the membrane material.