The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2005
Filed:
Mar. 19, 2002
Ignacio Sanz-pastor, San Francisco, CA (US);
David L. Morgan, Iii, Redwood City, CA (US);
Ignacio Sanz-Pastor, San Francisco, CA (US);
David L. Morgan, III, Redwood City, CA (US);
Aechelon Technology, Inc., San Carlos, CA (US);
Abstract
Object in a scene are antialiased individually in an object-specific manner, according to the type of object in question. One type of object is antialiased using a multipass screen-space jitter technique, where multiple instances of each antialiased object are render and blended together, with a small displacement in screen space coordinates for each copys. Another type of object is antialiased using a single-pass growth antialasiang technique, where the actual rendered geometry is changed in real time in accordance with distance and angle to minimize aliasing artifacts. Most objects are preferably antialiased using the first technique, with the second technique being most suited to high contrast, long and thin objects, such as runway lines or power line