The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2005
Filed:
Jun. 20, 2003
Hyung-seok OH, Suwon, KR;
Dong-hwan Kim, Suwon, KR;
Hyung-Seok Oh, Suwon, KR;
Dong-Hwan Kim, Suwon, KR;
Samsung SDI Co., Ltd., Suwon, KR;
Abstract
A shadow mask includes an aperture area having a plurality of apertures through which electron beams pass; a non-aperture area extending a from a circumference of the aperture area; and a skirt formed extending from an outer circumference of the non-aperture area at a predetermined angle, wherein the front surface of the aperture area is formed satisfying the following conditions,100%<RMV'/RMV<110%120%<RMS/RMV′<150% where RMV is a vertical radius of curvature of the front surface of the aperture area with respect to a vertical direction passing through a center of the aperture area, RMS is a vertical radius of curvature with respect to a short side of the aperture area, and RMV′ is a vertical radius of curvature of the front surface of the aperture area with respect to the vertical direction at a location on a horizontal axis passing through the center of the aperture area.