The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 14, 2005

Filed:

Oct. 12, 2001
Applicants:

Hanry Yu, Irvine, CA (US);

Kam W. Leong, Ellicott City, MD (US);

Ser-mien Chia, Singapore, SG;

Inventors:

Hanry Yu, Irvine, CA (US);

Kam W. Leong, Ellicott City, MD (US);

Ser-Mien Chia, Singapore, SG;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12N011/00 ; C12N011/02 ; C12N011/10 ;
U.S. Cl.
CPC ...
Abstract

A non-disruptive three-dimensional culture system allows cell growth and proliferation in three dimensions, permitting cell splitting without subjecting cells to disruptive conditions that affect cell structure and functions. An extracellular matrix provides a good environment for culturing or co-culturing anchorage-dependent cells. The cells cultured this manner can be readily used in such applications as cell transplantation, tissue engineering seeding of cells on scaffolds, and other applications that require immediate availability of functioning cells.


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