The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2005
Filed:
May. 30, 2001
Brian Maiorella, Oakland, CA (US);
Duane Inlow, Oakland, CA (US);
William Howarth, Richmond, CA (US);
Brian Maiorella, Oakland, CA (US);
Duane Inlow, Oakland, CA (US);
William Howarth, Richmond, CA (US);
Chiron Corporation, Emeryville, CA (US);
Abstract
A method of determining the optimal level of product expression and cell growth of animal cell culture is described. The method generally comprises culturing cells under conditions of solute stress, that is, under conditions whereby optimal cell growth or growth rate is decreased yet levels of product expression are increased. In a preferred embodiment of the invention is described a method of increasing the yield of monoclonal antibodies comprising culturing hybridoma cells in an environment of solute stress. One approach to the creation of such an environment is the addition of inorganic salts, organic polyols, or metabolic products to the culture medium. One-to three-fold increases in antibody yield have been obtained by these methods.