The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2005
Filed:
Apr. 22, 2003
Chao Peng Chen, Fremont, CA (US);
Chunping Luo, Milpitas, CA (US);
Stuart Kao, Fremont, CA (US);
Jei-wei Chang, Cupertino, CA (US);
Chao Peng Chen, Fremont, CA (US);
Chunping Luo, Milpitas, CA (US);
Stuart Kao, Fremont, CA (US);
Jei-Wei Chang, Cupertino, CA (US);
Headway Technologies, Inc., Milpitas, CA (US);
Abstract
As feature sizes approach 0.1 μm or smaller, reduction of line edge roughness (LER) becomes increasingly important. Significant reductions in edge roughness have been achieved by applying a second Ebeam exposure after the initial one that is used to define the pattern. After this second blanket exposure a longer heat treatment and a stronger development process than before are used. In addition to reducing edge roughness the disclosed treatment allows the CD to be reduced under tight control since the amount of CD reduction is proportional to the second Ebeam dosage.