The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2005
Filed:
Sep. 22, 2003
Applicants:
William C. Allison, Murrysville, PA (US);
Robert G. Swisher, Pittsburgh, PA (US);
Alan E. Wang, Gibsonia, PA (US);
Inventors:
William C. Allison, Murrysville, PA (US);
Robert G. Swisher, Pittsburgh, PA (US);
Alan E. Wang, Gibsonia, PA (US);
Assignee:
PPG Industries Ohio, Inc., Cleveland, OH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D011/00 ;
U.S. Cl.
CPC ...
Abstract
The present invention relates to a polishing pad. In particular, the polishing pad of the present invention comprises a sublayer, a middle layer, and a top layer which can function as a polishing layer. The polishing pad of the present invention is useful for polishing articles and particularly useful for chemical mechanical polishing or planarization of a microelectronic device, such as a semiconductor wafer.