The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Jul. 26, 2004
Hiroyuki Shirota, Kyoto, JP;
Akira Kuwabara, Kyoto, JP;
Hiroyuki Shirota, Kyoto, JP;
Akira Kuwabara, Kyoto, JP;
Dainippon Screen Mfg. Co., Ltd., Kyoto, JP;
Abstract
A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which spatially modulates reflected light. Light from the micromirrors of the DMD are directed to irradiation regions () on the substrate, respectively. The irradiation regions () are moved over the substrate with movement of the substrate relative to the head. The DMD is provided within the head so that the direction of arrangement of the irradiation regions () is tilted relative to the main scanning direction, and a center-to-center distance (L) along the sub-scanning direction between two adjacent irradiation regions () arranged in the main scanning direction is made equal to a pitch (P) of writing cells () on the substrate with respect to the sub-scanning direction. ON/OFF control of light irradiation of each irradiation region is performed each time the irradiation regionsmove a distance equal to twice a pitch (P).