The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Sep. 11, 2002
Mira Ben-tzur, Sunnyvale, CA (US);
Krishnaswamy Ramkumar, San Jose, CA (US);
Christopher A. Seams, Pleasanton, CA (US);
Thurman J. Rodgers, Woodside, CA (US);
Mira Ben-Tzur, Sunnyvale, CA (US);
Krishnaswamy Ramkumar, San Jose, CA (US);
Christopher A. Seams, Pleasanton, CA (US);
Thurman J. Rodgers, Woodside, CA (US);
Cypress Semiconductor Corporation, San Jose, CA (US);
Abstract
In one embodiment, a metal level includes a plurality of metal lines. A low-k dielectric is deposited over the metal level such that an air gap forms at least between two metal lines. The relatively low dielectric constant of the low-k dielectric reduces capacitance on metal lines regardless of whether an air gap forms or not. The air gap in the low-k dielectric further reduces capacitance on metal lines. The reduced capacitance translates to lower RC delay and faster signal propagation speeds.