The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Oct. 03, 2002
Raluca Dinu, Redmond, WA (US);
Jeffrey K. Kressbach, Snohomish, WA (US);
Louis J. Bintz, Bothell, WA (US);
Raluca Dinu, Redmond, WA (US);
Jeffrey K. Kressbach, Snohomish, WA (US);
Louis J. Bintz, Bothell, WA (US);
Lumera Corporation, Bothell, WA (US);
Abstract
A microfabrication process for preparing articles in which a precursor article that includes (a) a substrate, (b) a first polymer layer overlying the substrate, (c) a second polymer layer overlying the first polymer layer, (d) a metal hardmask layer overlying the second polymer layer, and (e) a photodefinable layer overlying the metal hardmask layer is subjected to photolithographic imaging, developing, and plasma etching steps to form an article that includes the substrate and portions of the first polymer layer arranged in a pattern corresponding to the pattern of the photomask used for photolithographic imaging.