The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Jun. 19, 2002
Massud-a. Aminpur, Austin, TX (US);
Kay Hellig, Dresden, DE;
Massud-A. Aminpur, Austin, TX (US);
Kay Hellig, Dresden, DE;
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
For patterning an opening through a patterned material, a coating material, a slow-etch material, and a photoresist material are deposited over the patterned material. The opening is patterned through the photoresist material, and the slow-etch material exposed through the opening is etched away. The photoresist material and the coating material exposed through the opening are then etched away. A remaining portion of the slow-etch hard-mask material and the patterned material exposed through the opening are then etched away such that the coating material outside of the opening is exposed. A remaining portion of the coating material is then etched away with an etch agent that does not etch the patterned material.