The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2005
Filed:
Mar. 14, 2003
Bowie G. Keefer, Galiano Island, CA;
Matthew L. Babicki, West Vancouver, CA;
Andre Jason Joseph Boulet, Vancouver, CA;
Aaron M. Pelman, Vancouver, CA;
Brian G. Sellars, Coquitlam, CA;
Surajit Roy, Burnaby, CA;
Bowie G. Keefer, Galiano Island, CA;
Matthew L. Babicki, West Vancouver, CA;
Andre Jason Joseph Boulet, Vancouver, CA;
Aaron M. Pelman, Vancouver, CA;
Brian G. Sellars, Coquitlam, CA;
Surajit Roy, Burnaby, CA;
QuestAir Technologies Inc., Burnaby, CA;
Abstract
The present disclosure relates to systems and processes for adsorptive gas separations where a first gas mixture including components A and B is to be separated so that a first product of the separation is enriched in component A, while component B is mixed with a third gas component C contained in a displacement purge stream to form a second gas mixture including components B and C, and with provision to prevent cross contamination of component C into the first product containing component A, or of component A into the second gas mixture containing component C. The invention may be applied to hydrogen (component A) enrichment from syngas mixtures, where dilute carbon dioxide (component B) is to be rejected such as directly to the atmosphere, and with preferably nitrogen-enriched air as the displacement purge stream containing residual oxygen (component C).