The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2005

Filed:

Sep. 28, 2004
Applicants:

Zhizang Chen, Corvallis, OR (US);

Bao-sung Bruce Yeh, Corvallis, OR (US);

S. Jonathan Wang, Albany, OR (US);

Cathy P. Peltier, Corvallis, OR (US);

Inventors:

Zhizang Chen, Corvallis, OR (US);

Bao-Sung Bruce Yeh, Corvallis, OR (US);

S. Jonathan Wang, Albany, OR (US);

Cathy P. Peltier, Corvallis, OR (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J002/05 ; H01L023/48 ; H01L021/00 ;
U.S. Cl.
CPC ...
Abstract

An integrated circuit (IC) is formed on a substrate. The IC has a first well having a first dopant concentration that includes a second conductivity low-voltage transistor. The IC also has a second well having a dopant concentration equal to the first dopant concentration that includes a first conductivity high-voltage transistor. In addition, the IC has a third well having a second dopant concentration of an opposite type than the first well that includes a first conductivity low-voltage transistor. The first conductivity low-voltage transistor and the second conductivity low-voltage transistor are created without a threshold voltage (V) implant.


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