The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2005
Filed:
Jul. 07, 2003
Eiji Aoki, Yamatokooriyama, JP;
Eiji Aoki, Yamatokooriyama, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
A corrected mask pattern verification apparatus includes a graphic operation section for generating differential mask pattern data based on design mask pattern and corrected mask pattern; a graphic reduction-enlargement operation section for reducing the differential mask pattern data and enlarging the reduced differential mask pattern data, and generating graphic reduction-enlargement operation data; and an area comparison operation section for calculating an area of a differential mask pattern represented by the differential mask pattern data and comparing the calculated area with a prescribed area, and generating area comparison operation data indicating an area comparison operation result.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile