The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2005
Filed:
Jan. 18, 2000
Sputter chamber as well as vacuum transport chamber and vacuum handling apparatus with such chambers
Martin Dubs, Maienfeld, CH;
Roman Schertler, Wolfurt, AT;
Martin Dubs, Maienfeld, CH;
Roman Schertler, Wolfurt, AT;
Unaxis Balzers Aktiengesellschaft, Fuerstentum, LI;
Abstract
A sputtering chamber system and method uses at least one sputtering source with a new sputter surface at least approximately symmetrical with respect to a central axis. A substrate carrier is arranged to be drivingly rotatable about a substrate carrier axis. The central axis and the substrate carrier axis are oblique with respect to one another, and the sputtering source is a magnetron sputtering source. The new sputter surface is substantially rotationally symmetrical with respect to the central axis, with the central axis and the substrate carrier axis intersecting at least approximately. With respect to an angle β between the central axis and the substrate carrier axis,30°≦β≦60°,preferably40°≦β≦55°,particularly preferably43°≦β≦50°,particularlyβ≈45°.