The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2005
Filed:
Apr. 19, 2001
Karl A. Belser, San Jose, CA (US);
Neil Deeman, Alamo, CA (US);
Ga-lane Chen, Fremont, CA (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
A system and method for replicating magnetic patterns on hard disk media includes a mask located over or above a magnetic recording layer. The recording layer may include a single, dual, or multi-layer recording layer. A pattern is or has been formed in the mask, where the pattern defines the recordable regions and the non-recordable regions to be created in one or more layers within the recording layer. Portions of the recording layer are then exposed. An etch may then be performed to create grooves within one or more layers in the exposed regions of the recording layer. The magnetic properties of at least one layer in the exposed portions of the recording layer are then altered in order to create recordable or non-recordable regions. The mask is then removed from the recording layer.