The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2005
Filed:
Feb. 26, 2002
Noriaki Kandaka, Kawasaki, JP;
Masaki Yamamoto, Sendai, JP;
Noriaki Kandaka, Kawasaki, JP;
Masaki Yamamoto, Sendai, JP;
Nikon Corporation, Tokyo, JP;
Abstract
Methods are disclosed for manufacturing multi-layer film reflection mirrors, in which a desirable shape accuracy of a reflected wavefront can be obtained after locally scraping the multi-layer film. In an exemplary method, a multi-layer film (comprising respective alternating layers of at least two types of substances having different respective refractive indices) is superposedly formed on the surface of a mirror substrate. The multi-layer film has a constant period length, and the multi-layer film on the substrate is locally scraped to correct a phase of a reflected wavefront from the reflective surface of the mirror. The multi-layer film has an internal stress of 50 MPa or smaller. Alternatively or in addition, a compensating adjustment in a film formed on a reverse surface of the substrate can be made to cancel the stress perturbation caused by scraping of the multi-layer film on the obverse surface of the substrate.