The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2005
Filed:
Jul. 30, 2003
Takahisa Shiozawa, Tochigi, JP;
Takahisa Shiozawa, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An illumination optical system for illuminating a mask that arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern using light from a light source includes an illumination-light generating mechanism for dividing the light and for forming a quadrupole light intensity distribution around an optical axis on a predetermined surface that has substantially a Fourier conversion relationship with the mask, so as to resolve the predetermined pattern and restrain the auxiliary pattern from resolving, wherein at least one of a size of each pole of the quadrupole light intensity distribution or a distance between the optical axis and each pole of the quadrupole light intensity distribution are variable.
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