The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2005

Filed:

Dec. 21, 2000
Applicants:

Uwe Paul Schroeder, Langebrueck, DE;

Tobias Mono, Dresden, DE;

Inventors:

Uwe Paul Schroeder, Langebrueck, DE;

Tobias Mono, Dresden, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/54 ; G03B027/72 ;
U.S. Cl.
CPC ...
Abstract

A platefor projection lithography comprising a first opaque regionlocated at the center of the plateand a second opaque regionformed at the outer edgeof the plate. The first and second opaque regions define a light transmissive annular regionThe annular regioncomprises a first light transmissive areathat imparts a first phase shift to light passing therethrough and a second light transmissive areawhich imparts a second phase shift to light passing therethrough.


Find Patent Forward Citations

Schroeder, Uwe. (2005). Method and apparatus for aerial image improvement in projection lithography using a phase shifting aperture (U.S. Patent No. 6897943). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6897943

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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