The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6897939 B1

PDF
Full Text
Expired
Date of Patent:
May. 24, 2005

Filed:

Nov. 12, 2003
Applicant:

Hiromichi Hara, Tochigi, JP;

Inventor:

Hiromichi Hara, Tochigi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/42 ; G03B027/58 ; G03B027/62 ;
U.S. Cl.
CPC ...
Abstract

An exposure apparatus for exposing a substrate in a vacuum atmosphere includes vibration absorbing mounts that are disposed in a vacuum chamber in order to make it possible to support at least one exposure structure in the vacuum atmosphere with high precision. The at least one exposure structure includes at least one of a mask stage plate, a wafer stage plate, and a barrel surface plate. The vibration absorbing mounts are formed using metallic bellows. By the vibration absorbing mounts, the at least one exposure structure is supported in the vacuum chamber.


Find Patent Forward Citations

Hara, Hiromichi. (2005). Exposure apparatus (U.S. Patent No. 6897939). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6897939

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…