The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2005
Filed:
Oct. 03, 2003
Amy Freshour, JE Putte, NL;
Hua Guo, Selkirk, NY (US);
Robert L. Howe, Greenville, NY (US);
Edward N. Peters, Albany, NY (US);
Gary William Yeager, Rexford, NY (US);
Amy Freshour, JE Putte, NL;
Hua Guo, Selkirk, NY (US);
Robert L. Howe, Greenville, NY (US);
Edward N. Peters, Albany, NY (US);
Gary William Yeager, Rexford, NY (US);
General Electric, Pittsfield, MA (US);
Abstract
The invention relates to a method of forming a polyphenylene ether resin containing residual aliphatic unsaturation. A polyphenylene ether is reacted with a capping agent in a solvent to form the polyphenylene ether resin containing residual aliphatic unsaturation, which is precipitated from solution by combining the solution with an antisolvent. The precipitated polyphenylene ether resin containing residual aliphatic unsaturation has lower levels of residual impurities than the same compound isolated by devolatilization.