The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2005
Filed:
Jun. 04, 2002
Applicant:
Masao Kataoka, Ibaraki, JP;
Inventor:
Masao Kataoka, Ibaraki, JP;
Assignee:
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/47 ; B01L001/04 ; F24F003/16 ;
U.S. Cl.
CPC ...
Abstract
Environmental control equipment is provided for a developing apparatus for developing a light-exposed resist film with a developer in a wafer treating chamber. An air supply means, supplying air taken from outside into the wafer treating chamber, includes a chemical contaminant removal means for removing chemical contaminants from the air.
Kataoka, Masao. (2005). Environmental control equipment/method of developing apparatus for developing light-exposed resist film with developer in wafer treating chamber (U.S. Patent No. 6897165). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6897165
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile