The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2005

Filed:

Aug. 28, 2002
Applicant:

Taisuke Hirooka, Kobe, JP;

Inventor:

Taisuke Hirooka, Kobe, JP;

Assignee:

Neomax Co., Ltd., Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/30 ; H01L021/30 ;
U.S. Cl.
CPC ...
Abstract

A method of recording identifiers, each including a group of character strings A and B including z, and zcharacters, respectively, on plate members involves the use of a photomask of a first type and at least one photomask of a second type. The photomask of the first type has an opaque pattern defining the character string A. The photomask of the second type has an opaque pattern defining at least one of the characters of the character string B. The method further includes the steps of forming a photoresist layer on one of the plate members, selectively exposing the photoresist layer to a radiation through the photomask of the first type to form a latent image of the character string A in the photoresist layer, and forming a latent image of the character of the character string B in the photoresist layer through the photomask of the second type.


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