The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 24, 2005

Filed:

Dec. 19, 2002
Applicants:

Ravi Chidambaran, Canonsburg, PA (US);

Devesh Sharma, Washington, PA (US);

Pavan Raina, Sanewadi, IN;

Inventors:

Ravi Chidambaran, Canonsburg, PA (US);

Devesh Sharma, Washington, PA (US);

Pavan Raina, Sanewadi, IN;

Assignee:

Aquatech International Corporation, Canonsburg, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D061/48 ; C02F001/469 ;
U.S. Cl.
CPC ...
Abstract

A liquid treatment process is described for sequential removal of ionic species of progressively decreasing ionic strength without precipitation or 'scaling.' An aspect of the invention includes dual electrodeionization operations. The first electrodeionization operation is performed at a voltage calculated to remove strongly ionized species such as calcium and magnesium from the feed water without scaling. The product of the first electrodeionization operation is then subjected to a second electrodeionization operation. The second electrodeionization operation is performed at a voltage greater than the first electrodeionization operation, and is designed to remove more weakly ionized species such as silica and carbon dioxide, preventing scaling. More than two successive electrodeionization operations may be performed if desired. Multiple electrodeionization operations may occur in a single electrodeionization stack or in multiple electrodeionization stacks.


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