The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2005

Filed:

Mar. 25, 2003
Applicant:

Sridhar Ramaswamy, Plano, TX (US);

Inventor:

Sridhar Ramaswamy, Plano, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F017/50 ;
U.S. Cl.
CPC ...
Abstract

Determining a substrate resistance network includes receiving a description of a substrate network including nodes. Elements of the substrate network are identified and associated with one or more nodes, where the elements include nwell structures. For each nwell structure, a ring geometry and area geometries result from dividing the nwell structure, where the area geometries represent an inward portion of the nwell structure and where each area geometry is associated with an area resistive element and an area coordinate. The ring geometry represents a perimeter portion of the nwell structure. Side geometries are formed from the ring geometry, each side geometry associated with a side resistive element. An nwell group is formed including the area geometries associated with the nwell structure in accordance with the area coordinates. An nwell resistance network is determined for each nwell group using the area resistive elements and the side resistive elements.


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