The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2005
Filed:
Dec. 04, 2000
Karl Emerson Mautz, Austin, TX (US);
Alain Bernhard Charles, Singapore, SG;
John George Maltabes, Austin, TX (US);
Ralf Schuster, Dresden, DE;
Karl Emerson Mautz, Austin, TX (US);
Alain Bernhard Charles, Singapore, SG;
John George Maltabes, Austin, TX (US);
Ralf Schuster, Dresden, DE;
Freescale Semiconductor, Inc., Austin, TX (US);
Infineon Technologies SC300 GmbH & Co. oHG, Dresden, DE;
Infineon Technologies AG, Munich, DE;
Abstract
The present invention relates to a system for the manufacture of semiconductor devices by lithography, and in particular to an assembly of mask containers for use in such a system. The system comprises: a plurality of mask containers adapted to engage with one another such that two or more containers can be carried together as a stack; a plurality of lithography bays; a transport rail system for carrying the containers between different lithography bays. Each lithography bay has a transmitter/receiver unit for communicating lithography data with a tracking device located in each container, allowing for more efficient mask management. The transportation of the containers in stacks results in an improvement in efficiency.