The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2005
Filed:
Jan. 22, 2004
Takeshi Nakayama, Fukaya, JP;
Takuya Mashimo, Kumagaya, JP;
Tohru Takahashi, Osato-gun, JP;
Hiroyuki Oda, Fukaya, JP;
Takeshi Nakayama, Fukaya, JP;
Takuya Mashimo, Kumagaya, JP;
Tohru Takahashi, Osato-gun, JP;
Hiroyuki Oda, Fukaya, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A shadow mask is formed by lapping a main mask and an auxiliary mask on each other. The auxiliary mask includes a porous portion having electron beam passage holes, nonporous portions situated individually at the opposite ends of the porous portion, a pair of skirt portions extending individually from the nonporous portions and lapped on the skirt portion of the main mask, and second beads formed individually on the skirt portions and overlapping first beads of the main mask. The height or width of the first beads and the second beads in a superposed portion in which the main mask and the auxiliary mask are lapped on each other is differentiated from that of the beads in non-superposed portions outside the superposed portion.