The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2005
Filed:
Jun. 16, 2003
Steven Shuyong Xiao, Laval, CA;
Chunong Qiu, Brossard, CA;
Cindy Xing Qiu, Brossard, CA;
Organic Vision Inc., Brossard, CA;
Abstract
The present invention discloses methods to remove impurities in polymeric materials in order to improve the opto-electronic characteristics of devices fabricated from these polymers. The polymers include but not limited to polyarylenes, polyarylenevinylenes, polyaryleneethylnylene, polyfluorenes, polyanilines, polythiophenes, polypyrroles, and any conjugated co-polymers. The methods involve the selection of a scavenger or chelating agent and use it to remove metallic impurities from the polymers. The methods involve dissolving the polymer in a suitable solvent, adding a scavenger, mixing to form a scavenger, containing phase, and finally separating the scavenger containing phase from the polymer phase. According to this invention, it is preferable for the selected scavengers to have functional groups which can chemically react with metallic species and form a coordination compound that is not soluble in a selected solvent. The selected scavenger can be used in a free stand form or carried by either organic or inorganic media.