The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2005
Filed:
Oct. 25, 2002
Yoshihiro Wakamatsu, Tokyo, JP;
Satoru Watano, Osaka, JP;
Yoshihiro Wakamatsu, Tokyo, JP;
Satoru Watano, Osaka, JP;
Nara Machinery Co., Ltd., Tokyo, JP;
Abstract
The present invention relates to a rotating fluidized bed apparatus for powder particle. A gas circulation path is formed at the periphery of the treatment chambervia the circumferential faceplate, and the circumferential faceplate is adapted to rotate around an axis. Behavior of powder particles can be controlled by introducing gas from the periphery of the treatment chamber via the circumferential plateto exert centripetal force on the powder particle, while exerting centrifugal force on the powder particles accompanying rotation of the circumferential plate. In another aspect, by making the arrangement proportion of the bag filterinside the treatment chamberwider than the surface width of the dispersion plateor larger than the surface area of the dispersion plate, it is possible to cause gas that has flowed into the treatment chamberto be discharged at a lower rate at an axial region inside the treatment chamberwhere centrifugal force is weak and discharge rate is fast. It is possible to carry out optimal operation control of introduction and discharge of gas for fluidized bed behavior.