The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2005
Filed:
Jan. 13, 2004
Yoshihiro Mizuno, Kawasaki, JP;
Satoshi Ueda, Kawasaki, JP;
Osamu Tsuboi, Kawasaki, JP;
Ippei Sawaki, Kawasaki, JP;
Hisao Okuda, Kawasaki, JP;
Fumio Yamagishi, Kawasaki, JP;
Norinao Kouma, Kawasaki, JP;
Yoshihiro Mizuno, Kawasaki, JP;
Satoshi Ueda, Kawasaki, JP;
Osamu Tsuboi, Kawasaki, JP;
Ippei Sawaki, Kawasaki, JP;
Hisao Okuda, Kawasaki, JP;
Fumio Yamagishi, Kawasaki, JP;
Norinao Kouma, Kawasaki, JP;
Fujitsu Limited,, Kawasaki, JP;
Fujitsu Media Devices Limited, Nagano, JP;
Abstract
A method of making a micromirror unit is provided. In accordance with the method, a micromirror unit is made from a material substrate having a multi-layer structure composed of silicon layers and at least one intermediate layer. The resulting micromirror unit includes a mirror forming base, a frame and a torsion bar. The method includes the following steps. First, a pre-torsion bar is formed by subjecting one of the silicon layers to etching. The obtained pre-torsion bar is rendered smaller in thickness than the mirror forming base and is held in contact with the intermediate layer. Then, the desired torsion bar is obtained by removing the intermediate layer contacting with the pre-torsion bar.