The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2005
Filed:
Oct. 17, 2002
Cheng-jen Chu, Ilan, TW;
Chin-cheng Chien, Tainan, TW;
Cheng-Jen Chu, Ilan, TW;
Chin-Cheng Chien, Tainan, TW;
Abstract
A method of fabricating slant reflector with bump structure, at least comprising the steps of: providing a substrate; forming a photosensitivity material layer on the substrate; patterning the photosensitivity material layer to form m groups of pattern (m≧1, m is positive integral), and each group of pattern includes a plurality of bumps with different bottom area; and jointing the bumps to form a slant surface with bump structure. The photosensitivity material layer is either orderly or randomly patterned to form m groups of patterns. The step of patterning the photosensitivity material layer includes exposing and developing. The invention utilizes one photo-mask with particular pattern to fabricate the bump structure in a simple way.